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Photoelectrical and optical properties of Pb_(1-x)Mn_xTe(Ga) epitaxial films

机译:PB_(1-X)MN_XTE(GA)外延膜的光电和光学性质

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The experimental results of photoelectric and optic properties on the gallium contained (N_(Ga)=0,5/1 at%), Pb_(1-x)Mn_xTe epitaxial films with thickness d=1/5 μm, obtained by a molecular beam condensation method on BaF_2 (111) substrate have been presented. The films have been photosensitivity at T=77 K and spectral maximum of photosensitivity were displacement in the short-wave length of spectrum, with introduction Mn, which are introduced to some increasing of the gap width in Pb_(1-x)Mn_xTe. Analogous phenomenon have been observed by investigating of absorption optic edge bound also by the increase gap width. The magnitudes of gap width, determined by spectral dependence of absorption edge and photoconductivity are in the satisfactorily condition.
机译:通过分子梁获得的镓含有(N_(Ga)= 0.5 / 1处的镓上含镓(N_(Ga)= 0.5 / 1atiOn%)的实验结果,Pb_(1-x)Mn_xte外延膜,由分子束获得的厚度d = 1 /5μm已经提出了BAF_2(111)基板上的冷凝方法。薄膜在T = 77k的光敏性下是光敏性,并且光敏性的光谱最大值在频谱短波长度中位移,引入Mn,其被引入到Pb_(1-x)Mn_xte中的间隙宽度的一些增加。通过调查增加的间隙宽度也通过调查吸收光学边缘结合而观察到类似的现象。通过光谱依赖性测定的吸收边缘和光电导率确定的间隙宽度的幅度是令人满意的条件。

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