首页> 外文会议>Conference on Microscopy of Semiconducting Materials >Core Composition of Partial Dislocations in N-Doped 4H-SiC Determined by TEM Techniques, Dislocation Core Reconstruction and Image Contrast Analysis
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Core Composition of Partial Dislocations in N-Doped 4H-SiC Determined by TEM Techniques, Dislocation Core Reconstruction and Image Contrast Analysis

机译:通过TEM技术,脱位核心重建和图像对比度分析的N-DOPED 4H-SiC中部分脱位的核心组成

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Defects were created in N-doped 4H-SiC by cantilever bending from a scratch on the (1120) surface under compression. They consist of two stacking faults (double stacking faults) expanding from the scratch in [1100] or [1100] directions. The character and core composition of the leading Shockley partial dislocations were determined by coupling WB, LACBED, contrast analysis of (1120) HRTEM images and dislocation core reconstructions. Each double stacking fault is due to the glide of a pair of identical Si-core partial dislocations in two adjacent glide planes in which the Si-C dumbbells exhibit the same orientation. Such a feature as well as the asymmetrical expansion of the defects is related to lack of mobility of C-core partial dislocations in that range of temperatures (550 °C-700 °C).
机译:在压缩下的(1120)表面上的悬臂上通过悬臂弯曲在n掺杂的4H-SiC中产生缺陷。它们由两种堆叠故障(双堆叠故障)组成,从[1100]或[1100]方向上展开。通过偶联WB,LACBED,对比度分析(1120)HRTEM图像和位错核心重建来确定领先的震撼部分脱位的特征和核心组成。每个双堆叠故障都是由于在两个相邻的滑动平面中的一对相同的Si芯部分位错的滑动,其中Si-C哑铃表现出相同的取向。这种特征以及缺陷的不对称扩展与在温度范围内的C芯部分脱位的迁移率缺乏迁移率(550℃-700℃)。

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