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MERCURY PSEUDO-MOSFET (HgPET) DRAIN CURRENT DEPENDENCE ON SURFACE TREATMENT

机译:水银伪MOSFET(HGPET)漏极依赖表面处理

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The effects of surface treatment by a dilute HF rinse on the drain current - gate voltage characteristics in HgFETs have been investigated by experimental measurements and numerical simulations. The apparent threshold voltage increases and interface trap density decreases with time after the HF rinse is due to a coupling between the Si film/BOX interface and the positively charged, hydrogen-terminated surface acting as a back gate in the thin-film folly depleted HgFET.
机译:通过实验测量和数值模拟研究了通过稀释的HF冲洗对稀释HF冲洗的影响HGFET中的漏极电流栅极电压特性。由于Si薄膜/箱界面和带正电的,氢封端的表面之间的耦合,表观阈值电压增加和接口捕集密度随着时间的推出而作用为薄膜叶面耗尽的HGFET中的后栅极。

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