A Study on the Preparation of TiO_(2-x)N_x Films by Reactive Deposition and Their Absorption Properties in Visible Region

摘要

The nitrogen-doped TiO_2 thin films were prepared by mid-frequency alternative reactive magnetron sputtering technique. The N concentration of the nitrogen-doped TiO_2 thin films was analyzed by XPS. And the absorption spectra of the films in ultraviolet and visible region were also investigated. The results show that the mid-frequency alternative reactive magnetron sputtering technique is a convenient method for growing TiO_(2-x)N_x. Annealing the nitrogen-doped TiO_2 thin film in nitrogen atmosphere under 380 deg C is helpful for increase the concentration of nitrogen in the film, but the ratio of N_2 in reactive gas is mainly influence the concentration of nitrogen in the Ti-N bond in the TiCh film. The increase of the thickness of nitrogen-doped TiO_2 films will enhance the absorbability of the film in the ultraviolet and visible region. The wavelength of the absorption edge of TiO_(2-x)N_x film with 1.5 percent nitrogen shift to 441nm from 387nm, which is the absorption edge for undoped TiO_2 films.