Structure,Composition,and Morphology of Photoelectrochemically Active TiO_(2-x)N_x Thin Films Deposited by Reactive DC Magnetron Sputtering

Julius M.Mwabora; Torbjorn Lindgen; Esteban Avendano; Thomas F.Jaramillo; Jun Lu; Sten-Eric Lindquist; Claes-Goran Granqvist

首页> 外文期刊>The journal of physical chemistry, B. Condensed matter, materials, surfaces, interfaces & biophysical >Structure,Composition,and Morphology of Photoelectrochemically Active TiO_(2-x)N_x Thin Films Deposited by Reactive DC Magnetron Sputtering

【24h】

Structure,Composition,and Morphology of Photoelectrochemically Active TiO_(2-x)N_x Thin Films Deposited by Reactive DC Magnetron Sputtering

机译：直流磁控溅射沉积光电化学活性TiO_（2-x）N_x薄膜的结构，组成和形貌

获取原文

获取原文并翻译 | 示例

掌桥外文数据库（机构版） >>

开具论文收录证明 >>

文献代查 >>

页面导航

摘要
著录项
相似文献
相关主题

摘要

Films of nitrogen-doped TiO_2 were made by reactive DC magnetron sputtering in a mixture of argon,oxygen,and nitrogen.The nitrogen gas ratio PHI was varied in the 0

机译：在氩，氧，氮混合气体中，通过反应直流磁控溅射制备了氮掺杂的TiO_2薄膜。沉积过程中氮气比率PHI在0

著录项

来源
《The journal of physical chemistry, B. Condensed matter, materials, surfaces, interfaces & biophysical》 |2004年第52期|共6页
作者
Julius M.Mwabora; Torbjorn Lindgen; Esteban Avendano; Thomas F.Jaramillo; Jun Lu; Sten-Eric Lindquist; Claes-Goran Granqvist;
展开▼
作者单位

展开▼
收录信息
原文格式 PDF
正文语种 eng
中图分类
关键词

相似文献

外文文献
中文文献
专利

1. Structure,Composition,and Morphology of Photoelectrochemically Active TiO_(2-x)N_x Thin Films Deposited by Reactive DC Magnetron Sputtering [J] . Julius M.Mwabora, Torbjorn Lindgen, Esteban Avendano, The journal of physical chemistry, B. Condensed matter, materials, surfaces, interfaces & biophysical . 2004,第52期

机译：直流磁控溅射沉积光电化学活性TiO_（2-x）N_x薄膜的结构，组成和形貌
2. Photoluminescence and compositional-structural properties of ion-beam sputter deposited Er-doped TiO_(2-x)N_x films: Their potential as a temperature sensor [J] . D. Scoca, M. Morales, R. Merlo, Journal of Applied Physics . 2015,第20期

机译：离子束溅射沉积掺Er的TiO_（2-x）N_x薄膜的光致发光和组成结构性质：其作为温度传感器的潜力
3. Structure, morphology and composition of thin Pd and Ni films deposited by dc magnetron sputtering on polycrystalline Ni and Pd foils [J] . Pinheiro LMP, Maluf SS, Gobbi AL, Journal of Physics, D. Applied Physics: A Europhysics Journal . 2005,第23期

机译：直流磁控溅射在多晶Ni和Pd箔上沉积的Pd和Ni薄膜的结构，形态和组成
4. Microstructure of TiO_(2-x) thin films reactively sputtered by DC magnetron [C] . K. Zakrzewska, A. Brudnik, E. Kusior, Minerals, Metals and Materials Society . 2000

机译：TiO_（2-x）薄膜通过DC磁控管反应地溅射的微观结构
5. Novel Thin Film Transparent Conducting Oxides Deposited by DC Reactive Magnetron Sputtering. [D] . Stevens, Blake LeRoy. 2010

机译：直流反应磁控溅射沉积的新型薄膜透明导电氧化物。
6. Biocompatibility and Surface Properties of TiO2 Thin Films Deposited by DC Magnetron Sputtering [O] . Francisco López-Huerta, Blanca Cervantes, Octavio González, 2014

机译：直流磁控溅射沉积TiO2薄膜的生物相容性和表面性质
7. Structure and Surface Morphology of Cr-Zr-N Thin Films Deposited by Reactive DC Magnetron Sputtering [O] . Chantharangsi C., Denchitcharoen S., Chaiyakun S., 2012

机译：直流磁控溅射沉积Cr-Zr-N薄膜的结构和表面形貌

Structure,Composition,and Morphology of Photoelectrochemically Active TiO_(2-x)N_x Thin Films Deposited by Reactive DC Magnetron Sputtering

摘要

著录项

相似文献

相关主题

期刊订阅