首页> 外文会议>European Conference on Silicon Carbide and Related Materials >Temperature Stability of Heteropolytypic 6H/3C FETs
【24h】

Temperature Stability of Heteropolytypic 6H/3C FETs

机译:杂多型6H / 3C FET的温度稳定性

获取原文

摘要

The formation of two-dimensional electron gases (2DEG) at the polytypic 6H/3C heterojunction is investigated. The main of study was to obtain the properties of the 3C/6H structure using Technology Computer Aided Design (TCAD) software. The electron-density distribution and conduction band profile in 6H/3C SiC heterojunction are calculated as a function of temperature. Simulation of these hetero-junctions has concentrated on the I-V behaviour over a range of temperatures between 350 and 650 K. We show that the device characteristics are substantially degraded at high temperatures and this will limit the use of these devices to moderate temperature applications.
机译:研究了在多液体6H / 3C异质结处形成二维电子气(2deg)。研究主要是使用技术计算机辅助设计(TCAD)软件获得3C / 6H结构的性能。在6H / 3C SiC异质结中的电子密度分布和导通带突度作为温度的函数计算。这些异质结的模拟集中在350和650K之间的温度范围内的I-V行为上。我们表明该器件特性在高温下显着降低,这将限制这些器件的使用以适度的温度应用。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号