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Advances in Fine Pitch Lead Free Assembly Process

机译:精细间距导通组装过程的进步

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This research focuses on evolving the best possible criteria for selecting high electrical performance 100 micron pitch lead free solder bumping process. This is achieved through modeling and simulating the pad, process, reliability and test strategy. Coplanar waveguides (CPW) were modeled to evolve process criteria for pad design and choice of materials. Polyimide was chosen as the passivation on the chip. Further signal parasitics were studied for the passivation and a selection criterion was evolved for its thickness. The pad and the passivation layers were studied for dielectric loss when subjected to thermal cycling (air to air). This evaluation leads to the selection of the best pad configuration for lead free solder. An in-depth study on how internal resistance of the solder contributes to the change in parasitics is presented through numerical and simulated models. Standard under bump metallurgy (UBM) was used on the pads. Lead free solder (Sn3.5AgO.3Cu) was chosen as the bumping material. Bumping strategy was evolved by which solder can be deposited on the UBM without stencil printing or electroplating. Flip chip B-stage underfill was also evaluated for wafer level application and standardized. This paper concludes by suggesting the best design, process and reliability criteria which should be adopted for lead free solder 100 μm pitch flip-chip.
机译:本研究侧重于改进选择高电气性能100微米间距引线无铅焊料凸块工艺的最佳标准。这是通过建模和模拟焊盘,过程,可靠性和测试策略来实现的。共有COPLANAR波导(CPW)模拟以发展垫设计和材料选择的过程标准。选择聚酰亚胺作为芯片上的钝化。研究了进一步的信号寄生剂,用于钝化,并在其厚度中演化选择标准。在经受热循环(空气到空气)时,研究了焊盘和钝化层进行介电损耗。该评估导致选择无铅焊料的最佳焊盘配置。通过数值和模拟模型提出了对焊料的内阻对寄生液变化有助于变化的深度研究。在焊盘上使用凸块冶金(UBM)下的标准。选择无铅焊料(SN3.5AGO.3CU)作为凸块材料。进化碰撞策略,可以在没有模板印刷或电镀的UBM上沉积焊料。还评估了倒装芯片B级底部填充物,用于晶片水平应用和标准化。本文通过暗示最佳设计,工艺和可靠性标准来结束,该标准应该用于100μm间距倒装芯片的无铅焊料。

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