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Stabilization of Ceramic Strain Gages to Temperatures beyond 1500°C

机译:稳定陶瓷应变计以超过1500°C的温度

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Thin film strain gages based on indium-tin-oxide (ITO) are being developed to measure static and dynamic strain at temperatures approaching 150°C. These ceramic strain gages exhibit excellent oxidation resistance and high temperature stability, surviving tens of hours of strain testing at temperatures as high as 1530°C in air. A thickness dependence of the active ITO strain elements on the high temperature stability and piezoresistive response of the ceramic strain gages was observed. Thick ITO strain elements exhibited a relatively large piezoresistive response at temperatures approaching 1500°C and beyond. In addition to the ITO thickness, it was determined that aluminum doping of the ITO strain elements had a profound effect on the high temperature stability of these ceramic strain sensors. Electron spectroscopy for chemical analysis (ESCA) depth files showed that interfacial reactions between ITO and aluminum were responsible for its enhanced stability via the inter-diffusion of aluminum and indium at these temperatures, which produced a very stable ITO/Al{{sub}2O{sub}3 solid solution. To determine the nature of the interfacial reaction product, ITO films were deposited onto high purity Al{sub}2O{sub}3 and AlN surfaces and were thermally cycled to 1500°C. The reason for including AlN as part of this study was to eliminate sources of oxygen transport to the interface, so that aluminum-indium interactions alone could be studied. ITO films were deposited on Al{sub}2O{sub}3 and AlN surfaces by rf sputtering. In some instances, platinum was deposited on the surface prior to the ITO deposition. ESCA depth profiles showed that an interfacial reaction had occurred between the ITO and the Al{sub}2O{sub}3 and/or AlN. This observation was based on the presence of two new indium-indium peaks at 448.85 and 456.40eV. These peaks correspond to the indium 3d5 and 3d3 binding energies, the values of which are significantly higher than these associated with stoichiometric indium-tin-oxide films. The results of our efforts to improve the high temperature stability of ITO strain gages are presented as well as the piezoresitive response of selected ITO strain gages in the temperature range 25- 1550°C.
机译:正在开发基于氧化铟锡(ITO)的薄膜应变计以在接近150℃的温度下测量静态和动态应变。这些陶瓷应变剂表现出优异的抗氧化性和高温稳定性,在空气中高达1530℃的温度下恢复数小时的应变测试。观察到活性ITO应变元素对陶瓷应变计的高温稳定性和压阻响应的厚度依赖性。厚的ITO应变元件在接近1500°C及更远的温度下表现出相对大的压阻响应。除了ITO厚度之外,确定ITO应变元件的铝掺杂对这些陶瓷应变传感器的高温稳定性产生了深刻的影响。用于化学分析的电子光谱(ESCA)深度文件表明,ITO和铝之间的界面反应通过在这些温度下通过铝和铟的间扩散而引起其增强的稳定性,这产生了非常稳定的ITO / Al {{} 2o {Sub} 3固溶解决方案。为了确定界面反应产物的性质,ITO膜沉积在高纯度的Al {子} 2O {子} 3和AlN表面并热循环至1500℃。作为本研究的一部分包括ALN的原因是消除对界面的氧气传输来源,从而可以研究单独的铝 - 铟相互作用。通过RF溅射沉积ITO薄膜在Al {Sub} 2O {Sub} 3和AlN表面上。在某些情况下,在ITO沉积之前沉积在表面上的铂。 ESCA深度剖面显示ITO和Al {Sub} 3和/或ALN之间发生界面反应。该观察结果基于448.85和456.40EV的两个新铟铟峰的存在。这些峰对应于铟3D5和3D3结合能,其值比这些与化学计量的铟锡氧化物膜相关显著更高。我们的努力提高ITO应变计的高温稳定性的结果呈现以及选定的ITO应变计的温度范围内25- 1550℃的piezoresitive响应。

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