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Stabilization of Ceramic Strain Gages to Temperatures beyond1500°C

机译:陶瓷应变计可稳定至超过温度1500°摄氏度

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Thin film strain gages based on indium-tin-oxide (ITO) are being developed to measure static anddynamic strain at temperatures approaching 1500°C. These ceramic strain gages exhibit excellentoxidation resistance and high temperature stability, surviving tens of hours of strain testing attemperatures as high as 1530°C in air. A thickness dependence of the active ITO strain elements on thehigh temperature stability and piezoresistive response of the ceramic strain gages was observed. ThickITO strain elements exhibited a relatively large piezoresistive response at temperatures approaching1500°C and beyond. In addition to the ITO thickness, it was determined that aluminum doping of theITO strain elements had a profound effect on the high temperature stability of these ceramic strainsensors. Electron spectroscopy for chemical analysis (ESCA) depth files showed that interfacialreactions between ITO and aluminum were responsible for its enhanced stability via the inter-diffusionof aluminum and indium at these temperatures, which produced a very stable ITO/Al_2O_3 solid solution.To determine the nature of the interfacial reaction product, ITO films were deposited onto high purityAl_2O_3 and AlN surfaces and were thermally cycled to 1500°C. The reason for including AlN as part ofthis study was to eliminate sources of oxygen transport to the interface, so that aluminum-indiuminteractions alone could be studied. ITO films were deposited on Al_2O_3 and AlN surfaces by rfsputtering. In some instances, platinum was deposited on the surface prior to the ITO deposition. ESCAdepth profiles showed that an interfacial reaction had occurred between the ITO and the Al_2O_3 and/orAlN. This observation was based on the presence of two new indium-indium peaks at 448.85 and456.40eV. These peaks correspond to the indium 3d5 and 3d3 binding energies, the values of which aresignificantly higher than these associated with stoichiometric indium-tin-oxide films. The results of ourefforts to improve the high temperature stability of ITO strain gages are presented as well as thepiezoresitive response of selected ITO strain gages in the temperature range 25- 1550°C .
机译:正在开发基于氧化铟锡(ITO)的薄膜应变计,以测量静电和 在接近1500°C时的动态应变。这些陶瓷应变计表现出优异的性能 耐氧化性和高温稳定性,可经受数十小时的应变测试 空气中的最高温度为1530°C。活性ITO应变元素在厚度上的依赖性 观察到了陶瓷应变计的高温稳定性和压阻响应。厚的 ITO应变元件在接近温度时表现出较大的压阻响应 1500°C及以上。除ITO厚度外,还确定铝的掺杂 ITO应变元素对这些陶瓷应变的高温稳定性有深远的影响 传感器。电子光谱化学分析(ESCA)深度文件显示界面 ITO和铝之间的反应是通过相互扩散增强稳定性的原因 在这些温度下,铝和铟的含量为5%,这产生了非常稳定的ITO / Al_2O_3固溶体。 为了确定界面反应产物的性质,将ITO膜沉积到高纯度上 将Al_2O_3和AlN表面热循环至1500℃。将AlN包括在内的原因 这项研究是为了消除氧气向界面传输的来源,从而使铝铟 可以单独研究相互作用。通过rf将ITO膜沉积在Al_2O_3和AlN表面上 溅射。在一些情况下,在ITO沉积之前将铂沉积在表面上。 ESCA 深度剖面表明,ITO和Al_2O_3和/或 AlN。该观察结果是基于在448.85和90°处存在两个新的铟-铟峰 456.40eV。这些峰对应于铟3d5和3d3的结合能,其值为 明显高于化学计量的铟锡氧化物薄膜。我们的结果 提出了提高ITO应变计的高温稳定性的努力,以及 选定的ITO应变计在25至1550°C的温度范围内的压阻响应。

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