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Crystal Structure of Low-Resistance Au-Ni/p-GaN Contacts

机译:低电阻Au-Ni / P-GaN触点的晶体结构

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The atomic arrangement of Ni-Au contacts on p-type GaN has been studied by transmission electron microscopy. A sharp transition between GaN and Au is observed, with no intermediate phases present. Lattice parameter measurements of the Au layer reveal that the Au layer is fully relaxed. The epitaxial relationship between the Au layer and the GaN film is (111)Au//(0002)GaN, [110]Au//[1120]GaN. Careful analysis of lattice images indicates that Au is directly in contact with Ga on p-GaN. Ni, which is used primarily as a wetting later, is not present at the interface. The separation between Ga and Au atoms at the interface was found to be 2.5?. Comparison of experimental and calculated images gives a best match for the interface separation obtained by TEM that corresponds to covalent Ga bonded to metallic Au, with a bond length of 2.5 A.
机译:通过透射电子显微镜研究了p型GaN上的Ni-Au接触的原子布置。观察到GaN和Au之间的急剧过渡,没有存在中间阶段。 Au层的晶格参数测量显示Au层完全放松。 Au层和GaN膜之间的外延关系是(111)Au //(0002)GaN,[110] Au // [1120] GaN。仔细分析晶格图像表明Au直接与P-GaN上的Ga接触。界面以后主要用作润湿的Ni不存在。发现界面处Ga和Au原子之间的分离是2.5?实验和计算的图像的比较给出了通过TEM获得的界面分离的最佳匹配,其对应于与金属Au粘合的共价Ga,粘合长度为2.5a。

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