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Molecular-beam Epitaxial Growth Of α-Zn0.05Sr0.95S Codoped With Eu And Sm On MgO(001) Substrate Via -MnS Buffer Layer

机译:通过-MNS缓冲层,在MgO(001)衬底上用EU和SM编写的α-Zn0.05SR0.95s的分子束外延生长

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High quality -ZnxSr1–xS with a single-phase rocksalt structure can be epitaxially deposited on (001) MgO substrate using -MnS buffer layer under appropriate growth conditions. We observed efficient infrared-stimulated luminescence (ISL) with a peak at ~ 620 nm when visible-light-irradiated -Zn0.05Sr0.95S:Eu,Sm thin films were stimulated with IR light. The observed ISL intensity is stronger in Zn0.05Sr0.95S:Eu,Sm as compared to SrS:Eu,Sm. We propose that the ISL emission intensity in SrS:Eu, Sm is enhanced not only by the inclusion of Zn but also due to the growth of film at high substrate temperature.
机译:具有单相旋转结构的高质量-ZnxSR1-XS可以在适当的生长条件下使用-MNS缓冲层外延沉积在(001)MgO衬底上。当可见光照射-ZN0.05SR0.95S时,我们观察到高效红外刺激的发光(ISL)在〜620nm时达到峰值,用红外光刺激SM薄膜。观察到的ISL强度在ZN0.05SR0.95S中更强大:欧盟,与SRS相比,SM:欧盟,SM。我们建议SRS中的ISL发射强度:欧盟,SM不仅通过包含Zn而增强,而且由于高基板温度的薄膜的生长。

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