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Strain and Intermixing in Single Ge/Si Quantum Dots Observed by Tip-enhanced Raman Spectroscopy

机译:通过尖端增强拉曼光谱观察到单一GE / Si量子点中的应变和混合中的混凝剂

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Tip-enhanced Raman spectra of as-grown self-assembled Ge/Si quantum dots have been observed with nano-scale spatial resolution. It is found that the Ge-Ge and Si-Ge modes in the Raman spectra were significantly enhanced only when the tip was on the Ge/Si dots. The Ge content in a single dot was estimated from the relative intensity of the Ge-Ge and Si-Ge modes. It is also found that the Si substrate peak at 520 cm~(-1) was shifted considerably in the neighborhood of the Ge/Si dots. This means that the Si substrate suffers stress around the dots.
机译:已经观察到以纳米级空间分辨率观察到生长的自组装GE / Si量子点的尖端增强拉曼光谱。发现只有当尖端在GE / SI点上时,才能显着增强拉曼光谱中的GE-GE和SI-GE模式。从GE-GE和SI-GE模式的相对强度估计单个点中的GE内容。还发现,在GE / SI点的附近,Si衬底峰值在520cm〜(-1)处被相当移动。这意味着Si衬底在点周围遭受压力。

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