首页> 外文期刊>Electrochemical and solid-state letters >Annealing-Induced Group V Intermixing in InAs/InP Quantum Dots Probed by Micro-Raman Spectroscopy
【24h】

Annealing-Induced Group V Intermixing in InAs/InP Quantum Dots Probed by Micro-Raman Spectroscopy

机译:显微拉曼光谱探测InAs / InP量子点中的退火诱导的V组混合

获取原文
获取原文并翻译 | 示例
           

摘要

Post-growth intermixing by rapid thermal annealing in self-assembled InAs/InP quantum dot (QD) structures with and without SiO_2 capping has been investigated. Room-temperature photoluminescence spectra measured from the intermixed QD structures show substantial blue shift accompanied by an increase in the PL intensity. Such group V intermixing is further probed by micro-Raman scattering technique. Apart from InAs and InP related longitudinal optical and transverse optical phonon peaks, Raman spectra show the appearance of InAs- and InP-like phonon peaks from InAsP-like alloy formed at the QD interfaces. These alloy modes show substantial peak shift with respect to annealing temperature and clearly indicates As/P exchange at the QD interfaces.
机译:研究了快速热退火在具有和不具有SiO_2封盖的自组装InAs / InP量子点(QD)结构中的生长后混合。从混合QD结构测得的室温光致发光光谱显示出明显的蓝移,并伴随着PL强度的增加。通过微拉曼散射技术进一步探究这种V族混合。除了InAs和InP相关的纵向光学声子峰和横向光学声子峰,拉曼光谱还显示了在QD界面处形成的InAsP类合金的InAs类和InP类声子峰。这些合金模式显示出相对于退火温度的明显峰移,并清楚地表明QD界面处的As / P交换。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号