Properties of Films Prepared by Microwave Plasma-Assisted Chemical Vapour Deposition under the Open-Air Condition

摘要

Reactive plasma has been generated under the open air condition by microwave excitation of a downstream flowing mixture of hydrogen and methane. The plasma was characterized by optical emission spectroscopy (OES). The peeks of the OES originated in the components of the air like nitrogen and oxygen were seen in the plasma. Two kinds of hard carbonate films were fabricated using the open-air plasma. In the experiments of the open-air condition, diamond films were deposited in using hydrogen and methane gases and diamond-like-carbon films were also deposited in higher methane concentration. The hardness of the diamond-like-carbon films were about 15-20 GPa.