self-assembly; indium compounds; III-V semiconductors; quantum dot lasers; semiconductor quantum dots; gallium arsenide; optical fabrication; MOCVD; cw lasing; self-assembled InAs quantum dot lasers; GaAs substrates; metalorganic chemical vapour deposition; laser characteristics; continuous-wave lasing; room temperature; low threshold current; semiconductor lasers; 25 degC; 6.7 mA; 1.18 mum; InAs-GaAs; GaAs;
机译:金属有机化学气相沉积法生长的InAs / GaAs自组装量子点激光器-生长后退火对堆叠的InAs量子点的影响
机译:通过金属有机化学气相沉积从堆叠的InAs / GaAs量子点和低温生长的AlGaAs覆层发射1.28μm激光
机译:通过低压金属有机化学气相沉积提高在InGaAs / GaAs上生长的自组装InAs量子点的均匀性
机译:自组装InAs量子点激光器在金属有机化学气相沉积生长的GaAs衬底上的连续激光激射
机译:铝砷化镓-砷化镓-砷化镓-砷化铟量子点通过低压金属有机化学气相沉积与量子阱异质结构激光器耦合。
机译:硅衬底上直接生长的InAs / InGaAs / GaAs量子点太阳能电池
机译:在Gaas衬底上通过金属有机化学气相沉积生长的InGaas / InGaasp / InGap量子阱激光二极管的界面结构