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Conductivity of a CMOS Silicon Nitride Layer

机译:CMOS氮化硅层的电导率

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Tins paper reports on the detailed characterization of the surface conductivity of CMOS silicon nitride layers under various environmental conditions. The nitride layers are applied as passivation layers in gas sensors based on suspended gate field effect transistors (SGFET). Test structures consisting of comb electrodes were characterized at temperatures between 20°C and 80°C and relative humidities between 20% and 90%. Values of the surface sheet resistance R{sub}(sq) between 10 Ω and 5 × 10{sup}17Ω were extracted from steady-state resistance measurements and transient measurements probing the time-dependent surface charging. The experimental results are compared with finite element simulations which implement the effect of surface charging through a distributed resistor-capacitor network.
机译:纸纸报告关于各种环境条件下CMOS氮化硅层表面电导率的详细表征。基于悬浮栅极场效应晶体管(SGFET),将氮化物层施加为气体传感器中的钝化层。由梳状电极组成的测试结构在20℃和80℃之间的温度和20%和90%之间的温度下表征。从稳态电阻测量和瞬态测量探测时间依赖性表面充电的稳态电阻测量和瞬态测量,提取了10Ω和5×10 {SUP}17Ω之间的表面薄层{sub}(Sq)的值。将实验结果与有限元模拟进行比较,其实现通过分布式电阻电容器网络的表面充电的影响。

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