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The Control of Intergranular Oxidation Brittleness in Silicon Carbides by Grain Boundary Engineering

机译:晶界工程控制碳化硅碳化硅中晶间氧化脆性的控制

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On the basis of recent findings of the effect of grain boundary character on oxidation and the possibility of controlling oxidation-induced intergranular brittleness in a nickel alloy, the present work was performed to confirm the applicability of grain boundary engineering to the control of intergranular oxidation-induced brittleness in silicon carbides with dopants such as Mg, Al and P. Silicon carbide samples were produced by hot-pressing at 2373K and 40MPa for 300s from high purity β-SiC powder with a sintering aid of 0.5 mass% B. The grain boundary character distributions (GBCDs) in different types of silicon carbides were determined by using the FEG-SEM / OIM before an oxidation test. The weight changes associated with oxidation were measured as functions of oxidation time, temperature and oxygen partial pressure. Fracture behaviour of oxidized specimens whose GBCD had been analyzed was examined by 3-point bending tests at room temperature. The OIM analyses of the GBCD revealed that the frequency of random boundaries, which were preferentially oxidized, and the frequency of low ∑, particularly ∑3 boundaries being the most resistant to oxidation could be changed by selecting the dopant element. It was found that the oxidation-induced embrittlement could be effectively suppressed by decreasing the grain size and increasing the frequency of oxidation-resistant special boundaries. Thus we confirmed that oxidation induced brittleness can be controlled by grain boundary engineering in silicon carbides.
机译:在最近发现晶界特征对氧化的影响和控制氧化型晶间狭窄在镍合金中的可能性的可能性,进行了本作本作的工作以证实晶界工程对晶间氧化控制的适用性 - 通过以2373k和40MPa的热压从高纯度β-SiC粉末的热压产生碳化硅样品,碳化硅样品如Mg,Al和P.碳化硅样品的碳化硅碳化物等掺杂剂。通过在氧化试验前使用FEG-SEM / OIM确定不同类型的碳化硅中的字符分布(GBCDS)。测量与氧化相关的重量变化作为氧化时间,温度和氧分压的函数。通过在室温下通过3点弯曲试验检查了氧化标本的抗氧化样本的裂缝行为。 GBCD的OIM分析显示,通过选择掺杂元件,可以改变优先氧化的随机边界的频率,以及低σ,特别是σ3边界的频率可以改变。发现通过降低晶粒尺寸并增加抗氧化特殊边界的频率,可以有效地抑制氧化诱导的脆化。因此,我们确认氧化诱导的脆性可以通过碳化硅中的晶界工程来控制。

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