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Calibration of test reticles for qualification of imaging properties of microlithographic projection lenses

机译:用于测试晶体的测试晶体的校准,用于微刻录投影镜片的成像性质

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We report on investigations and calibrations of chrome on quartz 5" test reticles with periodic line structures which are applied for qualification of optical performance of microlithographic lenses. The measurements are focused on the precise determination of the line-to-space ratio of the test grid structures which is a necessary input information for the objective lens qualification procedure applied. Calibrations of linewidths and line-to-space ratios of the test structures with nominal CD values between 280 nm and 600 nm are mainly performed with a special low-voltage scanning electron microscope (SEM) supported by optical transmission microscopy calibrations on a small number of all test structures to be measured. The requirements on the measurement uncertainties of the line-to-space ratios are about 5 %. In addition to the CD calibrations, investigations were started to estimate the influence of e-beam induced carbon deposition on the mask on the objective lens imaging properties.
机译:我们报告了石英5“测试掩模的铬的调查和校准,其具有周期性线结构,用于施加用于微光学透镜光学性能的鉴定。测量集中在精确测定试验网格的线间比率的精确测定作为所应用的物镜资格程序的必要输入信息。主要用特殊的低压扫描电子校准具有标称CD值的测线宽和测试结构的线路空间比的校准通过光学传输显微镜校准支持的显微镜(SEM)在少量待测量的所有测试结构上。对空间比率的测量不确定性的要求约为5%。除CD校准外,调查是开始估计电子束诱导碳沉积对物镜成像性质上掩模的影响s。

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