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X-Ray Topographic Investigation of Strain Field Generated by 200 MeV Ag~(14+)Ions in GaAs (100)

机译:在GaAs(100)中200meV Ag〜(14 +)离子产生的应变场的X射线地形研究

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Structural changes in GaAs (100) wafers irradiated with high energy (200 Mev) heavy ions have been studied using X-ray topography. By choosing suitable diffraction vectors it has been possible to explore lattice distortion in the inelastic and elastic loss regions separately. A part from the expected strain in the elastic loss region, lattice strain has also been found in the in the top surface layer which has suffered large inelastic energy loss. A novel diffraction effect observed in these samples could be used to estimate the depth of the damaged layers caused by the elastic and inelastic energy loss processes. Also, the contrast observed at the boundaries of irradiated and marked regions in transmission topographs is consistent with the lateral expansion of the irradiated regions.
机译:使用X射线形貌研究了用高能量(200meV)重离子照射的GaAs(100)晶片的结构变化。通过选择合适的衍射向量,已经可以分别探索无弹性和弹性损耗区域中的晶格变形。来自弹性损耗区域中预期应变的一部分,在顶部表面层中也发现了晶格菌株的晶格菌株,其遭受大的非弹性能量损失。在这些样品中观察到的新型衍射效果可用于估计由弹性和非弹性能量损失过程引起的受损层的深度。而且,在透射拓扑中的照射和标记区域的边界处观察到的对比度与辐照区域的横向膨胀一致。

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