Low-temperature deposition of the monocrystalline ZnO films by electron-beam evaporation at ion component composition control on the substrate

摘要

The deposition of ZnO films on different substrates by electron-beam evaporation is studied experimentally. The substrate is essentially held at a negative bias voltage during the process. The dependence of the lattice structure and photoluminescence spectra of the films on the type of substrate and the bias is investigated. It is shown that the incident ion stream resulting from the negative bias allows one to produce films at a lower substrate temperature. The bias that provides epitaxial growth is found to lie between --400 and --200 V. It is determined that the films deposited on (0001)-oriented sapphire have a carrier concentration of 7.5 ~*10~(18) cm~(-3) and a Hall mobility of 18.4cm~2/(V~*s).