COMPARISON OF THREE UNIVERSAL CURVES FOR THE ESCAPE PROBABILITY OF X-RAY EXCITED ELECTRONS II. EVALUATION OF LAYER THICKNESSES AS DETERMINED BY TOTAL ELECTRON YIELD (TEY)

摘要

The validity and limitations of the concept of universal curves for the escape probability of x-ray excited electrons were investigated by a series of TEY-measurements performed on thin pure element layers and ternary layers on GaAs-wafers. Layer thicknesses were chosen from a few nanometers up to several hundred nanometers and the electron energies covered a range from approximately 1 keV up to 20 keV. The essential result of TEY-measurements is that the layer thicknesses from TEY and from other methods are in very good agreement. Thus, the experiments are besides a confirmation of the analogy of the theoretical approaches of quantitative x-ray analysis and TEY analysis an excellent verification of the concept of universal curves for the escape probability of x-ray excited electrons.