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首页> 外文期刊>X-Ray Spectrometry: An International Journal >Total electron yield of electrons emitted by x-ray excitation from layered AlxGa1-xAs-GaAs structures
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Total electron yield of electrons emitted by x-ray excitation from layered AlxGa1-xAs-GaAs structures

机译:X射线激发层状AlxGa1-xAs-GaAs结构发出的电子的总电子产率

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摘要

Thin layers of AlxGa1-xAs on GaAs substrates are characterized by thickness t and composition x. Measuring the GaK total electron yield (TEY) jumps delivers either x for known t or vice versa. A result of this investigation is the possibility of determining both quantities of a single layer structure by a systematic variation of the incidence angle of x-radiation with regard to the specimen surface in the range 1-10degrees. Owing to the influence of the statistical significance of the measured data on the computed values of x and t, an x-ray source with sufficient photon flux is an essential requirement. Possible applications are x-values from 0 up to 0.5 and thicknesses from 0 up to 100 nm. Copyright (C) 2002 John Wiley Sons, Ltd. [References: 5]
机译:GaAs衬底上的AlxGa1-xAs薄层的特征是厚度t和组成x。测量GaK的总电子产率(TEY)跃变可得出已知t的x,反之亦然。该研究的结果是,可以通过相对于样本表面在1-10度范围内x射线的入射角的系统变化来确定单层结构的两个量。由于测量数据的统计显着性对x和t的计算值的影响,具有足够光子通量的X射线源是必不可少的。可能的应用是0到0.5的x值和0到100 nm的厚度。版权所有(C)2002 John Wiley Sons,Ltd. [参考:5]

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