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Novel assessment of process control monitor in advanced semiconductor manufacturing: a complete set of addressable failure site test structures (AFS-TS)

机译:高级半导体制造过程中工艺控制监视器的新型评估:一整套可寻址故障现场测试结构(AFS-TS)

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This work describes the implementation of a novel assessment of process control monitor in advanced semiconductor manufacturing. It manifests the design and simulation results of addressable failure site test structures. Four novel test structures -with three level interconnects have been developed and validated with in-house simulation system. The novel test structures are used to identify the locations of killer defects. A test chip of 22×6.6 mm{sup}2 containing four types test structures wasimplemented using 0.25μm logic backend of line process. This simple and efficient test structure for killer defect identification demonstrated its superiority in yield enhancement.
机译:这项工作描述了在先进半导体制造中对过程控制监视器进行了新的评估。它体现了可寻址故障现场测试结构的设计和仿真结果。已经开发了四个新型测试结构 - 具有三级互连,并验证了内部仿真系统。新型测试结构用于识别杀手缺陷的位置。 22×6.6mm {sup} 2的测试芯片,其中包含四种类型的测试结构,使用0.25μm逻辑后端的线路处理来实现。这种简单高效的杀手缺损识别测试结构证明了其优势在产量增强。

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