首页> 外文会议>International conference on optics and lasers >Hydroxyapatite thin films growth by pulsed laser deposition: effects of the Ti alloys substrate passivation on the film properties by the insertion of a TiN buffer layer
【24h】

Hydroxyapatite thin films growth by pulsed laser deposition: effects of the Ti alloys substrate passivation on the film properties by the insertion of a TiN buffer layer

机译:羟基磷灰石薄膜通过脉冲激光沉积生长:通过插入锡缓冲层的Ti合金基板钝化对膜性能的影响

获取原文

摘要

Hydroxyapatite (HA), Ca_5(PO_4)_3OH, is now widely used in stomatology and orthopedic surgery. Due to a good biocompatibility combined favorable bioactivity make as HA to be considered as a challenge to successful bone repair. We grow HA thin films on Ti-5Al-2.5Fe alloy substrate by pulsed laser deposition (PLD) technique. The films were deposited in vacuum at room temperature using a KrF excimer laser (λ = 248 nm, τ_(FWHM) ≥ 20 ns). After deposition the HA films were annealed at 550 °C in ambient air. The insertion of a bioinert TiN buffer layer at the HA film-metallic substrate interface was studied in terms of HA film microstructure and mechanical properties. SEM, TEM and SAED analysis structurally characterized films. The mechanical properties were evaluated by nanoindentation tests in static and scratch modes. Films with TiN interlayer contain uniquely crystalline HA phase and present better mechanical characteristics as compared with those deposited directly on Ti-alloy substrate.
机译:羟基磷灰石(HA),CA_5(PO_4)_3OH现在广泛用于口腔医学和整形外科。由于良好的生物相容性,合并良好的生物活性使得HA被视为成功骨骼修复的挑战。通过脉冲激光沉积(PLD)技术,我们在Ti-5Al-2.5Fe合金基板上生长HA薄膜。使用KRF准分子激光器(λ= 248nm,τ_(fwhm)≥20ns)在室温下在室温下沉积薄膜。沉积后,在环境空气中在550℃下退火HA薄膜。在HA薄膜微结构和机械性能方面研究了在HA膜 - 金属底物界面处的生物型锡缓冲层的插入。 SEM,TEM和SAED分析结构表征薄膜。通过以静态和划痕模式进行纳米茚调测试评估机械性能。与锡中间层的薄膜含有唯一的结晶HA相,与直接沉积在Ti合金基质上的那些相比,呈现更好的机械特性。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号