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Electrical and Optical Characteristics of Delta Doped AlGaN Cladding Layer Materials for Highly Efficient 340nm Ultra Violet LEDs

机译:用于高效340nm超紫光度LED的δ掺杂AlGaN包层材料的电气和光学特性

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In this paper, we report the electrical and optical characteristics of Si delta-doped AlGaN cladding layers, p-cladding structure optimization and the impact on the efficiency of 340nm AlGaN UV LEDs. Compared to the uniformly doped n-AlGaN layer, adding Si δ-doping layers reduced the sheet resistance by improving both the Hall mobility and carrier concentration. Increasing the number of Si δ-doped layers further lowered the sheet resistance without cracking the material. The δ-doped layers in n-Al_(0.3)Ga_(0.7)N improved the optical properties by enhancing near band edge emission as much as 2-fold relative to deep level emission. Additionally, δ-doping in n-AlGaN layers had no detrimental effect on the optical transparency of the LEDs. The p-cladding layer was found to have a strong absorption at 340nm. Reducing the p-GaN cap layer from 35nm to 10nm tripled the light emission intensity. By optimizing the n- and p-AlGaN cladding layers, a highly efficient UV LED at 340nm was achieved with 1mW output under 800mA/mm~2 DC drive current.
机译:在本文中,我们报告了Si Delta-掺杂的AlGaN包层,P层覆层结构优化以及对340nm AlGaN UV LED效率的影响的电气和光学特性。与均匀掺杂的N-AlGaN层相比,通过改善霍尔迁移率和载流子浓度,添加Siδ掺杂层降低了片性。增加Siδ掺杂层的数量进一步降低了薄片电阻而不破裂材料。 N-Al_(0.3)Ga_(0.7)N中的δ掺杂层通过相对于深度排放而增强近带边缘发射而改善了光学性质。另外,N-AlGaN层中的δ掺杂对LED的光学透明度没有不利影响。发现p包层层在340nm处具有很强的吸收。将P-GaN盖层从35nm减少到10nm的发光强度。通过优化N-和P-AlGaN包层层,通过在800mA / mm〜2 DC驱动电流下的1MW输出中实现了340nm的高效UV LED。

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