Ion-beam sputtered TiO/sub 2/-SiO/sub 2/ mixed films for thin film filter in DWDM application

机译：离子束溅射TiO / Sub 2 / -SiO / Sub 2 / Sum 2 /薄膜薄膜过滤器的混合膜在DWDM应用中

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TiO/sub 2/-SiO/sub 2/ mixed films were produced with ion beam sputter method. The refractive index of the mixed film was higher than that of conventional Ta/sub 2/O/sub 5/ films. Calculations show that bandwidth of thin film filters composed of the mixed films was significantly reduced.

机译：用离子束溅射法生产TiO / Sub 2 / -SiO /亚2 /混合膜。混合膜的折射率高于常规TA /亚/ o / sum 5 /薄膜的折射率。计算表明，由混合膜组成的薄膜过滤器的带宽显着降低。

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来源
《Pacific Rim Conference on Lasers and Electro-Optics》|2001年||共2页
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Shiuh Chao;
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中图分类 TN2-53;
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optical films; optical communication equipme; wavelength division multiplexing; silicon compounds; titanium compounds; optical filters; annealing; Rutherford backscattering; X-ray diffraction; sputtered coatings; sputter deposition; refractive index;

机译：光学膜;光学通信设备;波分复用;硅化合物;钛化合物;光学过滤器;退火;Rutherford背散射;X射线衍射;溅射涂层;溅射沉积;倒沉积;折射率;折射率;

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1. Residual stress in Ta_(2)O_(5)-SiO_(2) composite thin-film rugate filters prepared by radio frequency ion-beam sputtering [J] . Chien-Jen Tang, Cheng-Chung Jaing, Kuan-Shiang Lee, Applied optics . 2008,第13期

机译：射频离子束溅射制备Ta_（2）O_（5）-SiO_（2）复合薄膜波纹滤膜中的残余应力
2. Residual stress in Ta_(2)O_(5)-SiO_(2) composite thin-film rugate filters prepared by radio frequency ion-beam sputtering [J] . Chien-Jen Tang, Cheng-Chung Jaing, Kuan-Shiang Lee, Applied optics . 2008,第13期

机译：射频离子束溅射制备Ta_（2）O_（5）-SiO_（2）复合薄膜波纹滤膜中的残余应力
3. Stress relaxation in dual ion beam sputtered Nb2O5 and SiO2 thin films: application in a Fabry-Perot filter array with 3D nanoimprinted cavities [J] . Ullah Anayat, Wilke Hans, Memon Imran, Journal of Micromechanics and Microengineering . 2015,第5期

机译：双离子束溅射Nb2O5和SiO2薄膜中的应力松弛：在具有3D纳米压印腔的Fabry-Perot滤光片阵列中的应用
4. Ion-beam sputtered TiO/sub 4/-SiO/sub 2/ mixed films for thin film filter in DWDM application [C] . Shiuh Chao . 2001

机译：DWDM应用中用于薄膜滤光片的离子束溅射TiO / sub 4 / -SiO / sub 2 /混合膜
5. Dielectric thin-films by ion-beam sputtering deposition for III-V based infrared optoelectronic imaging. [D] . Nguyen, Jean. 2008

机译：通过离子束溅射沉积的介电薄膜，用于基于III-V的红外光电成像。
6. Ferromagnetic-like behavior of Co doped TiO2 flexible thin films fabricated via co-sputtering for spintronic applications [O] . Heiddy P. Quiroz, E.F. Galíndez, A. Dussan 2020

机译：自旋电子应用中通过共溅射制备的Co掺杂TiO2柔性薄膜的类铁磁行为
7. Modeling evaporation, ion-beam assist, and magnetron sputtering of TiO 2 thin films over realistic timescales [O] . Blackwell Sabrina, Smith Roger, Kenny Steven D., 2012

机译：在实际时间尺度上对TiO 2薄膜的蒸发，离子束辅助和磁控溅射建模
8. Optical Nonlinearity of Sputtered Co3O4-SiO2-TiO2 Thin Films. [R] . Yamamoto, H., Naito, T., Hirao, K. 2001

机译：溅射Co3O4-siO2-TiO2薄膜的光学非线性。

Ion-beam sputtered TiO/sub 2/-SiO/sub 2/ mixed films for thin film filter in DWDM application

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