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THERMODYNAMIC ANALYSIS FOR CRYSTAL GROWTH OF THE III-V COMPOUND

机译:III-V化合物晶体生长的热力学分析

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Partial pressure - temperature - composition correlation diagrams of the Ga-As, In-As, Ga-P and In-P systems were contracted based on the obtained experimental data of the phase diagram and thermodynamic properties for the III-V systems. The total vapor pressures of arsenic or phosphorus at melting point of GaAs, InAs, Gap and InP were determined as 101, 10.1, 1510 and 253 kPa, respectively, at the corresponding melting points of 1509, 1211, 1739 and 1336K, These diagrams are applied to the analysis of the horizontal Bridgman method and the liquid phase epitaxial growth technique. On the other hand, the analysis of the equilibrium state of the chloride-CVD process was carried out using the data of the Gibbs energy of the compounds obtained by authors.
机译:基于III-V系统的相图和热力学性能的所得实验数据,基于III-V系统的实验数据,分配GA-AS,IN-P和P系统的部分压力 - 温度 - 组合物相关图。在1509,1211,1739和1336K的相应熔点,分别测定为101,10.1,1510和253kPa的砷,InAs,间隙和InP的熔点的总蒸汽压力分别为101,10.1,1510和253kPa,这些图为应用于水平桥商方法及液相外延生长技术的分析。另一方面,使用作者获得的化合物的GIBBS能量的数据进行氯化物-CVD方法的平衡状态的分析。

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