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In-situ use of an Optical Microscope for FIB Microsurgery of Planarized Devices

机译:原位使用光学显微镜用于平坦化装置的FIB显微镜

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The extensive use of planarization in many of today's leading process technologies significantly reduces the effectiveness of FIB circuit modification and debugging. Planarization has played a significant role in the development of denser chips with increasingly smaller geometries. Fully planarized devices offer little or no surface features on which the FIB operator relies for orientation and alignment. These conditions lead to increased debug cycle times and decreased success rates using the FIB. Recent FIB tool advancements in the field of C4 (controlled-collapse chip connection) flip-chip packaged device modification and debug have also made it easier to work on highly planarized conventional wire-bond technology. The integration of an optical microscope with an infrared camera into the work chamber allows the operator to view the circuitry under the surface layer. This paper will offer several techniques for overcoming the challenges that planarized devices present by using this in-situ optical microscope. When properly implemented, these techniques can significantly improve the success rate and throughput time of device modification on highly planarized parts.
机译:在今天的许多领先过程技术中,平面化的广泛使用显着降低了FIB电路改装和调试的有效性。平坦化在具有越来越小的几何形状的密集芯片的发展中发挥了重要作用。完全平坦的设备提供很少或没有的表面特征,其中FIB操作员依赖于方向和对准。这些条件导致调试循环时间增加,并使用FIB降低成功率。 C4(受控折叠芯片连接)倒装芯片封装设备改造和调试领域的近期FIB工具进步还使得更容易在高度平坦化的传统线键技术上工作。光学显微镜与红外摄像机的集成到工作室中允许操作者在表面层下方观察电路。本文将提供几种技术,用于克服使用这种原位光学显微镜的平面化器件的挑战。当正确实施时,这些技术可以显着提高在高度平坦化部件上的设备改造的成功率和吞吐量。

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