Metrology Delay Time Reduction in Lithography with an Enhanced AMHS using Local FOUR Buffering

摘要

An enhanced Automated Material Handling System (AMHS) that uses a local FOUP buffer at each tool is presented as a method of enabling lot size reduction and parallel metrology sampling in the photolithography (litho) bay. The local FOUP buffers can be integrated with current OHT AMHS systems in existing fabs with little or no change to the AMHS or process equipment The local buffers enhance the effectiveness of the OUT by eliminating intermediate moves to stockers, increasing the move rate capacity by 15-20%, and decreasing the loadport exchange time to 30 seconds. These enhancements can enable the AMHS to achieve the high move rates compatible with lot size reduction down to 12-15 wafers per FOUP. The implementation of such a system in a photolithography bay could result in a 60-74% reduction in metrology delay time, which is the time between wafer exposure at a litho tool and collection of metrology and inspection data.