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Stacked Polysilicon/Metal Capacitors Failure Analysis

机译:堆叠多晶硅/金属电容故障分析

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Poly/metal stacked capacitors present challenges in terms of capacitor access and defect localization. The challenge of access can be overcome using parallel lapping to expose the contact and using chemicals to remove the dielectric. As for defect localization, LC or thermal localization (also OBIRCH/TIVA) and PVC are used. PVC was found to be effective in terms of finding the bad stacked capacitor and a bad capacitor within the stack. Internal probing between the capacitors within a stack allowed the differentiation between capacitor leakage and capacitor-capacitor shorting. For capacitor leakage, the defect can be identified by parallel lapping to remove the upper capacitor plate. For capacitor-capacitor short, if there is no visual defect seen, Pt chemical etch can be applied for PVC inspection.
机译:聚/金属堆叠电容器在电容器访问和缺陷本地化方面存在挑战。可以使用平行研磨来克服访问的挑战,以暴露接触并使用化学物质去除电介质。对于缺陷定位,使用LC或热定位(也使用obirch / Tiva)和PVC。发现PVC在找到堆叠内的坏堆叠电容和糟糕的电容方面是有效的。堆栈内电容器之间的内部探测允许电容器泄漏和电容器电容器之间的差异。对于电容器泄漏,可以通过并行研磨来识别缺陷以移除上电容器板。对于电容器电容器短,如果看不到视觉缺陷,则可以应用PT化学蚀刻进行PVC检测。

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