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CHEMICAL FILTRATION - DESIGNING FOR OVERALL EQUIPMENT EFFICIENCY

机译:化学过滤 - 整体设备效率设计

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Overall Equipment Efficiency is the measure of the portion of time that semiconductor device manufacturing equipment is actually making semiconductors. Keeping this number high keeps the cost of semiconductors low, eventually providing low cost, high performance computers and televisions to the consumer. Because the line width of semiconductor devices is approaching 0.25 μm, there is a requirement to remove smaller particles from the process fluids. Tighter Teflon ? PTFE filters are used to purify the aggressive acids, bases, and oxidizers used the clean and etch semiconductors. PTFE is hydrophobic, requiring IPA prewetting when the filters are used in aqueous-based chemicals. Chemical filters are disposables, requiring the process equipment to be shutdown periodically to replace them. The time needed to IPA wet, water flush, chemical flush, and requalify the tool may be three hours; valuable time when wafers are not being processed. In addition, as the PTFE filters become tighter, there is more dewetting in outgassing chemicals containing hydrogen peroxide. This results in loss of flow in the systems and frequent changeout of filters. To improve the OEE of the process equipment, Millipore developed the QuickChange ? filter. The QuickChange process includes a modification to the PTFE membrane to make the surface less hydrophobic which eliminates dewetting in outgassing solutions. Flow and particle retention remain high in these outgassing baths even under severe conditions such as draining the housing during chemical change. Extractables, particle retention, and particle cleanliness of QuickChange filters are nearly identical to standard Millipore all-Teflon filters. Another convenience of QuickChange filters is that they are supplied prewet in a bag. The filters are ready to be installed into any aqueous-based process chemical. This paper will describe the attributes of the QuickChange filter products, present the results of extensive field testing, and quantify the potential improvement in Overall Equipment Efficiency.
机译:整体设备效率是半导体器件制造设备实际制造半导体的时间部分的量度。保持该数字高保持半导体的成本低,最终为消费者提供低成本,高性能的计算机和电视。因为半导体器件的线宽接近0.25μm,所以需要从过程流体中去除较小的颗粒。 teflon tight tight teflon? PTFE过滤器用于净化侵蚀性酸,碱和氧化剂,使用清洁和蚀刻半导体。 PTFE是疏水性的,当过滤器用于基于水性化学物质时,需要IPA预制。化学过滤器是一次性产品,需要定期关闭过程设备以取代它们。 IPA潮湿,水冲洗,化学冲洗所需的时间,并保证工具可能是三个小时;没有加工晶圆的宝贵时间。另外,随着PTFE过滤器变得更敏感,随着含有过氧化氢的含有过氧化氢的除气化学品中更脱气。这导致系统中的流量丢失和频繁的过滤器转换。为了改善流程设备的OEE,Millipore开发了Quickchange?筛选。 QuickChange方法包括对PTFE膜的改性,使表面更少的疏水性,其消除了除气溶液中的脱水。即使在诸如在化学变化期间排出壳体的严重条件,这些除气浴中的流动和颗粒保留仍然高。 QuickChange滤光器的萃取物,颗粒保留和颗粒清洁度几乎与标准Millipore全铁氟龙过滤器相同。 Quickchange过滤器的另一个便利是它们在袋子中提供了预泡。过滤器已准备好安装到任何基于水的过程化学品中。本文将描述QuickChange过滤产品的属性,呈现出广泛的现场测试的结果,并量化整体设备效率的潜在提高。

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