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Electroless copper plating on alumina ceramic

机译:在氧化铝陶瓷的化学镀铜

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Electroless copper plating was carried out on alumina substrate. The Al_2O_3 substrates were etched under different conditions to study the correlation between the adhesion strength and the surface morphology of Al_2O_3 ceramic. It was confirmed that ceramic surface roughness and mechanical interlocking are two major causes promoting the adhesion. Molten NaOH etching, producing the combination of roughening and interlocking, could reach the greatest copper-to-ceramic adhesion with 20Mpa. Cu conductor pattern with high adhesion was selectively formed on the alumina substrate.
机译:在氧化铝基材上进行化学镀铜。在不同条件下蚀刻Al_2O_3基质,以研究Al_2O_3陶瓷的粘附强度和表面形态之间的相关性。证实陶瓷表面粗糙度和机械互锁是促进粘合性的两个主要原因。熔融NaOH蚀刻,产生粗糙和互锁的组合,可以达到20MPa的最大铜到陶瓷粘附。在氧化铝基材上选择性地形成具有高附着力的Cu导体图案。

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