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Measurement of the electron ionization coefficient at low electric fields in Heterojunction Bipolar Transistors

机译:异质结双极晶体管低电场电子电离系数的测量

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New data for the electron impact-ionization coefficient α_n in GaAs and In_(0.53)Ga_(0.47)As are derived from measurements of the multiplication coefficient M-1 in Heterojunction Bipolar Transistors (HBT). We show that the intrinsic limiting factors of the M-1 measurement at low electric fields are the Early effect and the uncertainty in the electric field value in the collector depletion region. By adopting HBT's characterized by lightly doped collectors and heavily doped base regions we were able to extend previously available data on the impact-ionization coefficient of GaAs and In_(0.53)Ga_(0.47)As by two orders of magnitude, down to α_n = 1 cm~(-1). Our data on In_(0.53)Ga_(0.47)As also confirm the theoretical results on the weak field dependence of α_n at low electric fields.
机译:GaAs中的电子冲击电离系数α_n的新数据和IN_(0.53)GA_(0.47),其从异质结双极晶体管(HBT)中的乘法系数M-1的测量结果导出。我们表明,在低电场下M-1测量的内在限制因素是收集器耗尽区域中电场值的早期效果和不确定性。通过采用轻微掺杂的收集器和重掺杂的基地区域的特征,我们能够将先前可用的数据延伸到GaAs和In_(0.53)Ga_(0.47)的撞击电离系数,如两个数量级,下降到α_n= 1 cm〜(-1)。我们的IN_(0.53)GA_(0.47)的数据还证实了在低电场α_n弱场依赖性的理论结果。

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