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Measurement of the electron ionization coefficient at low electric fields in Heterojunction Bipolar Transistors

机译:异质结双极晶体管中低电场下电子电离系数的测量

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New data for the electron impact-ionization coefficient α_n in GaAs and In_(0.53)Ga_(0.47)As are derived from measurements of the multiplication coefficient M-1 in Heterojunction Bipolar Transistors (HBT). We show that the intrinsic limiting factors of the M-1 measurement at low electric fields are the Early effect and the uncertainty in the electric field value in the collector depletion region. By adopting HBT's characterized by lightly doped collectors and heavily doped base regions we were able to extend previously available data on the impact-ionization coefficient of GaAs and In_(0.53)Ga_(0.47)As by two orders of magnitude, down to α_n = 1 cm~(-1). Our data on In_(0.53)Ga_(0.47)As also confirm the theoretical results on the weak field dependence of α_n at low electric fields.
机译:GaAs和In_(0.53)Ga_(0.47)As中电子碰撞电离系数α_n的新数据来自异质结双极晶体管(HBT)中倍增系数M-1的测量结果。我们表明,在低电场下M-1测量的固有限制因素是集电极耗尽区中的电场效应和电场的早期效应。通过采用以轻掺杂的集电极和重掺杂的基极区域为特征的HBT,我们能够将先前有关GaAs和In_(0.53)Ga_(0.47)As的碰撞电离系数的数据扩展两个数量级,降低到α_n= 1厘米〜(-1)。我们在In_(0.53)Ga_(0.47)As上的数据也证实了在低电场下α_n的弱场相关性的理论结果。

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