Metallization for microelectronics program at the University at Albany: leveraging a long-term mentor relationship

摘要

The program in chemical vapor deposition, (CVD) of metals for microelectronics applications at the University at Albany, SUNY, is presented as a working model for a broad, basic and applied research program. The proximity of SUNYA to IBM facilities has allowed the role of industrial mentor to expand to include appointment as adjunct professor or industry advisor to a Semiconductor Research Corporation fellow, and to submission of research proposals with a mentor as co-principal investigator and as associate director. Such depth of mutual commitment serves to ensure industrial relevance for both students and faculty. It provides a reliable resource for precompetitive research and early development.