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Bond-on-lead: a novel flip chip interconnection technology for fine effective pitch and high I/O density

机译:焊接领导:一种新型倒装芯片互连技术,用于精细有效间距和高I / O密度

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摘要

A new flip chip interconnection structure termed BOL (bond on lead) comprising attachment of bumps to narrow pads or traces as opposed to conventional circular capture pads has been developed. The motivation for such a structure is to free up real estate for escape routing of signal lines between bumps on the topmost layer of the substrate leading to either complete elimination of layer pairs or relaxation of design rules for routing on the top layer. The reliability of the asymmetric solder joint structure so formed is investigated using hi Pb (97% lead & 3% tin) bumps and ABF (Ajinomoto build-up film, or other widely used film based high density substrates) build-up and laminate substrates by means of a test vehicle device and through finite element analysis. It is shown that the solder joints are at least as reliable as conventional solder joints; furthermore, it is found that the maximum plastic strain in the solder joint is in fact reduced by virtue of the asymmetric BOL structure which in turn increases the fatigue resistance of the solder joint as well as reduces the stress on the silicon induced by CTE (coefficient of thermal expansion) mismatch. Extended reliability studies and formal qualification results are presented. The implications of the higher routing density enabled by BOL interconnection on substrates for common device families such as GPUs, ASICs, DSPs and FPGAs are examined - it is found that an I/O (input/output) density parameter termed "effective signal escape pitch" for most devices falls in the range of 50 /spl mu/m to 110 /spl mu/m and greater than 50 % of these devices can be routed in 4 layers using BOL methodology and a microstrip transmission line architecture, while the rest can be designed so as to relax the design rules for signal escapes on the top layer of the substrate.
机译:已经开发了一种新的倒装芯片互连结构,其包括将凸块附接到窄焊盘或迹线而导致与传统的圆形捕获垫相对的凸起互连结构。这种结构的动机是释放房地产,用于逃逸路线在基板上最顶层之间的凸起之间的信号线路,从而完全消除层对或放松设计规则以在顶层路由布线。使用Hi Pb(97%铅和3%锡)凸块和ABF(Ajinomoto积聚膜或其他广泛使用的薄膜基高密度基材)来研究所形成的不对称焊接接头结构的可靠性。积聚和层压基板通过测试车辆装置和通过有限元分析。结果表明,焊点至少与常规焊点一样可靠;此外,发现焊点中的最大塑性应变实际上借助于不对称的BOL结构减少,这又增加了焊点的疲劳电阻以及降低CTE引起的硅的应力(系数热膨胀)不匹配。提出了扩展的可靠性研究和正式资格结果。研究了BOL互连启用的较高路由密度的含义,例如GPU,ASIC,DSP和FPGA的常见设备系列的基板上 - 发现I / O(输入/输出)密度参数称为“有效信号逃生间距“对于大多数设备,在50 / SPL MU / M至110 / SPL MU / m的范围内,并且大于50%的这些设备可以使用BOL方法和微带传输线架构在4层中路由,而其余的可以设计成放宽用于基板顶层的信号逸出的设计规则。

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