首页> 外文会议>Indium Phosphide and Related Materials, 2001. IPRM. IEEE International Conference On >Low-temperature growth of GaInNAs/GaAs quantum wells for 1.3 μmlasers using metal-organic vapor-phase epitaxy
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Low-temperature growth of GaInNAs/GaAs quantum wells for 1.3 μmlasers using metal-organic vapor-phase epitaxy

机译:GaInNAs / GaAs量子阱的低温生长达1.3μm金属有机气相外延的激光

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GaInNAs/GaAs quantum-well (QW) lasers emitting at 1.3 μm weregrown using metal-organic vapor-phase epitaxy (MOVPE) in the limit ofvery low growth rate and temperature. The material was characterized byphotoluminescence (PL) spectroscopy as well as by implementation inbroad-area (BA) edge-emitting lasers. While the PL intensity was foundto decrease by more than two orders of magnitude between 1175 and 1350nm, the corresponding BA laser threshold current showed a much moremodest increase. For a 1.28-μm laser the transparency current was 0.8kA/cm2, the slope efficiency 0.24 W/A per facet and T0=100 K.Comparison between PL emission properties and BA laser performancerevealed a complex relationship. A high PL intensity does notnecessarily lead to low threshold-current lasers. In these cases, theFWHM seems to be the more relevant parameter for QW optimization
机译:发射出1.3μm的GaInNAs / GaAs量子阱(QW)激光器 使用金属有机气相外延(MOVPE)在以下条件下生长 生长速度和温度都非常低。该材料的特点是 光致发光(PL)光谱以及在 广域(BA)边缘发射激光器。发现PL强度 在1175和1350之间减少两个数量级以上 nm,相应的BA激光阈值电流显示出更多 适度增加。对于1.28μm激光器,透明电流为0.8 kA / cm2,每面的斜率效率0.24 W / A,T 0 = 100K。 PL发射特性和BA激光性能之间的比较 揭示了复杂的关系。高PL强度不会 必然导致低阈值电流激光器。在这些情况下, FWHM似乎是QW优化中最相关的参数

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