首页> 外文会议>Indium Phosphide and Related Materials, 2001. IPRM. IEEE International Conference On >Multi quantum well (MQW) lasers at 1550 nm fabricated with a singleepitaxial selective growth step by MOVPE without waveguide etching
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Multi quantum well (MQW) lasers at 1550 nm fabricated with a singleepitaxial selective growth step by MOVPE without waveguide etching

机译:单个制造的1550 nm多量子阱(MQW)激光器无波导刻蚀的MOVPE外延选择性生长步骤

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MQW lasers have been fabricated by means of a single selectiveepitaxial growth and without waveguide etching. Flat layer interfaceshave been obtained for a wide range of mask widths and mask openingswhile retaining material quality and providing wide bandgap tuning rangethrough the use of QW's. Initial results show good laser performance at1550 nm demonstrating the feasibility of the easy fabrication method forthe realisation of more complex devices by means of active-passiveintegration
机译:MQW激光器是通过单选择制造的 外延生长且无波导刻蚀。平面层接口 已获得广泛的掩模宽度和掩模开口 在保持材料质量的同时,提供了较宽的带隙调整范围 通过使用QW。初步结果显示出良好的激光性能 1550 nm证明了简便制造方法的可行性 通过主动-被动技术实现更复杂的设备 一体化

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