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High temperature performance of recent GaAs transistors

机译:最近的GaAs晶体管的高温性能

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Recent advances in the preparation of GaAs material and in GaAs technology have enabled diffused-base, alloyed emitter GaAs transistors to be constructed which exhibit fT's in excess of 1 Gc. Because of the greater band-gap (1.38 eV) of GaAs, these transistors should be operable at temperatures exceeding 350°C. The physical method of fabrication, however, limits these experimental transistors to a junction operating temperature of slightly greater than 200°C. In this paper the techniques employed to construct these transistors will be described; the limitations imposed on operating temperature by state-of-the-art technology and means of overcoming these limitations will be discussed. Data will be presented to characterize these GaAs transistors at elevated temperatures and will show that high frequency current gain (hfe) varies only slightly with temperature. Graphs displaying the variation of the other "h" parameters with temperature will be given, as will plots of the behavior of VCE(SAT)and Icowith increasing temperature. The significance of the high temperature stability of these GaAs transistors as it applies to both small signal and high power devices will be indicated.
机译:GaAs材料制备和GaAs技术方面的最新进展使得能够构造扩散基极合金化的发射极GaAs晶体管,这些晶体管的f T 超过1 Gc。由于GaAs的带隙较大(1.38 eV),因此这些晶体管应可在超过350°C的温度下工作。但是,物理制造方法将这些实验晶体管的结温限制在略高于200°C的水平。在本文中,将描述用于构造这些晶体管的技术。我们将讨论由最先进的技术对工作温度施加的限制以及克服这些限制的方法。将提供数据来表征这些GaAs晶体管在高温下的特性,并将显示高频电流增益(h fe )仅随温度而略有变化。将给出显示其他“ h”参数随温度变化的图形,以及随温度升高的V CE(SAT)和I co <​​/ inf>的行为图。这些GaAs晶体管的高温稳定性在小信号和高功率器件上的重要性都将被指出。

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