首页> 外文会议>Electron Devices Meeting, 2004. IEDM Technical Digest. IEEE International >3D quantum modeling and simulation of multiple-gate nanowire MOSFETs
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3D quantum modeling and simulation of multiple-gate nanowire MOSFETs

机译:多栅极纳米线MOSFET的3D量子建模和仿真

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The electronic transport in multiple-gate devices is theoretically investigated at ultimate cross-section channel limit by modeling ballistic nanowire MOSFET architectures. The electrical performances of these structures are compared as a function of their "equivalent gate number" and gate configuration. In this approach, the 3D Schrodinger-Poisson system is self-consistently solved and the ballistic transport is treated with the nonequilibrium Green's function formalism.
机译:通过建模弹道纳米线MOSFET架构理论上,在大学横截面通道极限下理论地研究了多栅极装置中的电子传输。将这些结构的电性能与其“等效门编号”和栅极配置进行比较。在这种方法中,3D Schrodinger-Poisson系统是自我持续解决的,并用非QuibiRibium的功能形式主义处理弹道传输。

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