Electro-thermal comparison and performance optimization of thin-body SOI and GOI MOSFETs

摘要

This paper examines self-heating trends in ultra-scaled fully depleted SOI and GOI devices. We introduce a self-consistent model for calculating device temperature, saturation current and intrinsic gate delay. We show that the raised device source/drain can be designed to simultaneously lower device temperature and parasitic capacitance, such that the intrinsic gate delay (CV/I) is optimal. We find that a raised source/drain height approximately 3 times the channel thickness would be desirable both from an electrical and thermal point of view. Optimized GOI devices could provide at least 30 percent performance advantage over similar SOI devices, despite the lower thermal conductivity of the germanium layer.