首页> 外文会议>Indium Phosphide and Related Materials, 1995. Conference Proceedings., Seventh International Conference on >Evolution of non-equilibrium intrinsic defects in indium phosphideduring the zinc diffusion from polymer spin-on films
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Evolution of non-equilibrium intrinsic defects in indium phosphideduring the zinc diffusion from polymer spin-on films

机译:磷化铟中非平衡固有缺陷的演变锌从聚合物旋涂膜扩散过程中

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To follow the evolution of non-equilibrium intrinsic defects(NID), particular emphasis has been placed on the poorly studied initialdiffusion stage (IDS) that corresponds to the time interval needed toincrease the temperature from room temperature to the diffusion one. Thegeneration and relaxation of NID can manifest themselves in a change ofmechanical properties of semiconductors as well as in an accumulation ofmore stable and extended defects such as dislocations and stackingfaults as well as S-pits. The comparison studies of distributionprofiles of defects and Zn atoms obtained after both IDS and the finaldiffusion stage (FDS) were carried out. Moreover, to evaluate the roleof NID in the Zn diffusion into InP, the Zn distribution profiles wereanalyzed in accordance with the calculation for GaAs performed in thecontext of the kick-out mechanism
机译:跟踪非平衡固有缺陷的演变 (NID),尤其是对学习不充分的初始内容给予了特别的重视 扩散阶段(IDS),对应于 将温度从室温升高到扩散温度之一。这 NID的产生和放松可以通过改变 半导体的机械性能以及 更稳定和扩展的缺陷,例如位错和堆叠 断层和S坑。分布比较研究 在IDS和最终加工后获得的缺陷和Zn原子的分布 进行扩散阶段(FDS)。而且,要评估作用 NID在Zn扩散到InP中的分布,Zn分布曲线为 根据在GaAs中执行的GaAs计算进行分析 排除机制的背景

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