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Semiconducting YBaCuO as infrared-detecting bolometers

机译:半导体YBaCuO作为红外检测辐射热计

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Abstract: This paper reports the fabrication of microbolometers using semiconducting YBaCuO as the IR sensing material. The detectors are operable at room temperature and thus are suitable for lost-cost and high performance imaging applications. Semiconducting YBaCuO is promising as a bolometric material as it has a thermal coefficient of resistance near 3% and relatively low noise. Two different bolometer structures will be reported here. First generation YBaCuO microbolometers were built on micromachined SiO$-2$/ bridges using wet etching techniques to undercut the silicon. The second generation structures were processed upon micromachined Si$-3$/N$-4$/ membranes with sputtered MgO films used as sacrificial layers. The membrane structures are the first of its kind to incorporate MgO as a sacrificial layer, and they offer a fabrication technique that is fully CMOS compatible, with all processing at ambient temperatures. Detectivities in the order of 10$+8$/ cm Hz$+$HLF$//W were measured at 30 Hz chopping frequency in both structures. The thermal conductance of the suspended membranes was on the order of 10$+$MIN@7$/ W/K, which is desirable as low thermal conductance yields high responsivities. There are realizable optimizations for both applications to yield detectivities over 10$+9$/ cm Hz $+$HLF$//W. All measurements reported here were performed at ambient temperature with no temperature stabilization. !23
机译:摘要:本文报道了使用半导体YBaCuO作为红外传感材料的微辐射热计的制造。该检测器可在室温下操作,因此适用于损失成本和高性能成像应用。半导体YBaCuO有望成为一种辐射热测量材料,因为它的电阻热系数接近3%,并且噪声相对较低。这里将报告两种不同的辐射热计结构。第一代YBaCuO微量辐射热计是在微加工的SiO $ -2 $ /电桥上使用湿法刻蚀技术对硅进行底切的。在微机械加工的Si $ -3 $ / N $ -4 $ /膜上处理第二代结构,并用溅射的MgO膜作为牺牲层。膜结构是将MgO用作牺牲层的同类产品中的第一种,它们提供了一种完全与CMOS兼容的制造技术,并且所有处理均在环境温度下进行。在两个结构中,在30 Hz斩波频率下,测量的检出率分别为10 $ + 8 $ / cm Hz $ + $ HLF $ // W。悬浮膜的热导约为10 $ + MIN @ 7 $ / W / K,这是合乎需要的,因为低热导产生高响应性。两种应用都有可实现的优化,以产生超过10 $ + 9 $ / cm Hz $ + $ HLF $ // W的检出率。此处报告的所有测量均在环境温度下进行,没有温度稳定性。 !23

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