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Semiconducting YBaCuO as infrared-detecting bolometers

机译:半导体YBACUO作为红外检测钻孔计

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This paper reports the fabrication of microbolometers using semiconducting YBaCuO as the IR sensing material. The detectors are operable at room temperature and thus are suitable for lost-cost and high performance imaging applications. Semiconducting YBaCuO is promising as a bolometric material as it has a thermal coefficient of resistance near 3% and relatively low noise. Two different bolometer structures will be reported here. First generation YBaCuO microbolometers were built on micromachined SiO$-2$/ bridges using wet etching techniques to undercut the silicon. The second generation structures were processed upon micromachined Si$-3$/N$-4$/ membranes with sputtered MgO films used as sacrificial layers. The membrane structures are the first of its kind to incorporate MgO as a sacrificial layer, and they offer a fabrication technique that is fully CMOS compatible, with all processing at ambient temperatures. Detectivities in the order of 10$+8$/ cm Hz$+$HLF$//W were measured at 30 Hz chopping frequency in both structures. The thermal conductance of the suspended membranes was on the order of 10$+$MIN@7$/ W/K, which is desirable as low thermal conductance yields high responsivities. There are realizable optimizations for both applications to yield detectivities over 10$+9$/ cm Hz $+$HLF$//W. All measurements reported here were performed at ambient temperature with no temperature stabilization.
机译:本文报道了使用半导体Ybacuo作为IR传感材料的微压计的制造。探测器可在室温下可操作,因此适用于损失成本和高性能的成像应用。半导体Ybacuo是具有辐射材料的主要耐热系数,其具有近3%和相对较低的噪音。这里将在此报告两种不同的大计结构。第一代YBACUO微致频带在MicroChined SiO $ -2 $ /桥梁上建造了使用湿法蚀刻技术来削弱硅片。第二代结构在MicroChined Si $ -3 $ / n $ -4 $ /膜上加工,用溅射的MgO膜用作牺牲层。膜结构是将MgO作为牺牲层的第一种,并且它们提供了一种完全CMOS兼容的制造技术,在环境温度下所有加工。在两个结构中以30 Hz斩波频率测量了10美元+ 8 $ / cm Hz $ + $ HLF $ // W的检测。悬浮膜的热敏导度约为10 $ + $最小@ 7 $ / w / k,这是理想的,因为低热导流产生高响应性。申请可实现可实现的优化,以产生超过10 $ + 9 $ / cm Hz $ + $ HLF $ // w的侦探。这里报告的所有测量在环境温度下进行,没有温度稳定。

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