Thermal stability of silicon-containing methacrylate-based bilayer resist for 193-nm lithography

摘要

Abstract: Thermal decomposition of silyl substituted methacrylate terpolymers containing acid sensitive groups was studied using thermogravimetric analysis. The onset of decomposition was found to be a function of the microenvironment, i.e. the molar% composition of the acid sensitive group monomer. The Flynn and Wall method of estimating E$-a$/ was used to estimate the E$-a$/ for decomposition of the terpolymer and where possible, for the acid sensitive group.!22