Lithographic evaluation of a new high-performance photoresist composition

摘要

Abstract: `Non-critical' levels such as implant layer consume a large volume of photoresist. This work was done to choose a cost- effective, high performance implant resist implant resist. IN addition to resolution considerations, outgassing during implant, speed and cost were all evaluated to choose the successful candidate. Through this effort a new resist formulation, Sumiresist$+TM$/ PFM-10 was compared with other existing I-line formulations.!0