LITHOGRAPHIC PROCESS MARGIN EVALUATION DEVICE, LITHOGRAPHIC PROCESS MARGIN EVALUATING METHOD, AND LITHOGRAPHIC PROCESS MARGIN EVALUATION PROGRAM

摘要

PPROBLEM TO BE SOLVED: To provide a lithographic process margin evaluation device having high accuracy, which can reduce working load. PSOLUTION: A layout pattern preparation section 27 in a lithographic process margin evaluation device 120 prepares a plurality of design layout patterns, with the use of analysis conditions and information stored in a layout pattern template holding section 22. A simulation condition preparation section prepares a plurality of simulation conditions, with the use of analysis conditions and information stored in a simulation conditions template holding section. A simulation section 17 prepares a plurality of actual layout patterns with the use of prepared conditions. PCOPYRIGHT: (C)2003,JPO