Flash vacuum-ultraviolet source utilizing a surface-discharge substrate

摘要

Abstract: damental studies for the flash vacuum-ultraviolet (VUV) source utilizing a surface-discharge substrate are described. This flash VUV source consists of the following essential components: a high-voltage power supply, a polarity-inversion- type high-voltage pulser with a condenser capacity of 14.3 nF, an oil diffusion pump, and a flash VUV chamber with a glass body. The VUV chamber employed a surface-discharge ferrite substrate that's pattern was formed by means of the copper vacuum evaporation and was connected to an oil diffusion pump with a pressure of 1.3 $MUL 10$+$MIN@3$/ Pa. The combined ceramic condenser in the pulser was charged from 10 to 30 kV by a power supply, and the electric charges in the condenser were discharged to the radiation chamber after closing a gap switch. Then the flash VUV rays were generated. The maximum values of the cathode voltage and the tube current were about $MIN@21 kV and 1.7 kA, respectively. The VUV outputs were measured by a combination of a plastic scintillator and a photomultiplier. The pulse durations of the VUV rays were nearly equivalent to the durations of the damped oscillations of the voltage and current, and their values were about 10 $mu@s. !19