Performance Comparison Between Three Measurement System of Scanning Microwave Microscopy

摘要

This paper presents first trial of performance comparison between three measurement system of scanning microwave microscopy (SMM) based on atomic force microscopy (AFM). As an important point of comparison, three measurement systems must measure the same area (at least $15 mumathrm{m} imes 60 mumathrm{m}$) of same sample under the same measurement conditions at observation frequency around 16.5 GHz. In the study, multilayered silicon sample with several n-type dopant density for each layer was utilized. The benefit of Silicon multilayered sample is its flat topology on the surface. In the analysis, results have been corrected the effects of sample tilt and surface topology to electromagnetic characteristic observations from raw measurement results obtained by SMM. Finally, performance of SMM system has been compared in measured magnitude and phase measurands along with sample width. As the result, three system produces almost same performance for silicon multilayered sample.