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Influence of Donor-Type Hole Traps Under P-GaN Gate in GaN-Based Gate Injection Transistor (GIT)

机译:GaN基栅极注入晶体管(GIT)中P-GaN栅极下的施主型空穴陷阱的影响

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Anomalous turn off (ATO) is observed for the GaN-based normally-off Gate injection Transistor (GIT) with a threshold voltage having smaller than 0.7 V. On the other hand, ATO is not observed for the GIT with a threshold voltage larger than 0.7 V. The commercialized GITs are free from the ATO, because their threshold voltages are controlled to be 1. 2 ±0. 3V, which is larger than 0.7 V. Device simulation study indicates that a donor-type hole trap is responsible for the ATO, because the internal electric field is large enough to induce the emission of the captured hole traps that are made when the device is turned off. It is simulated that the specified donor-type hole traps influence minor effects on the switching behavior.
机译:对于阈值电压小于0.7 V的GaN基常关栅极注入晶体管(GIT),观察到异常关断(ATO)。另一方面,对于阈值电压大于0.7 V的GIT,未观察到ATO。 0.7V。商业化的GIT不受ATO的影响,因为它们的阈值电压被控制为1. 2±0。 3V,大于0.7V。器件仿真研究表明,供体型空穴陷阱是ATO的原因,因为内部电场足够大,可以诱发捕获的空穴陷阱的发射。关闭。模拟表明,指定的施主型空穴陷阱对开关行为的影响较小。

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